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대일시스템

대일시스템

RAITH PIONEER Two EBL and SEM
DVIA-MB1000 Installation Report

Installation Reports

1. Measurement Details

  • Measurement Date
    April 18, 2020
  • Measurement Devices
    1. LAN-XI Data Acquisition Hardware
    – Brüel & Kjæ r 3050-B-040
    2. Data Analysis Software
    – Brüel & Kjæ r PULSE LAB SHOP 14
    3. Sensors
    – PCB Accelerometer
    – Model: 393B05
  • Measurement Location
    Ground Floor

2. Equipment Information

  • Manufacturer
    RAITH
  • Model
    PIONEER Two Electron Beam Lithography & SEM
  • Floor Vibration Specification
    The velocity of floor vibrations measured in a 1/3-octave RMS amplitude spectrum has
    to be less than 1.0 μm/sec for frequencies between the 1.6-Hz band and the 10-Hz band
    (including them). For frequencies above the 10-Hz band the maximum velocity should
    not exceed 2.0 μm/sec. (A similar result can be achieved, if the floor vibrations are less
    than the specifications defined by the standard NIST-A.)

3. Vibration Isolation System Information
Model: DVIA-MB1000

DVIA-MB Base Active Vibration Isolation Platform
Platform Dimensions 1140 x 910 x 224 mm
Load Capacity 500 - 1700 kg
Actuator Electromagnetic Actuator
Maximum Actuator Force Vertical: 40N, Horizontal: 20 N
Degrees of Freedom 6 degrees
Active Isolation Range 0.5 - 100 Hz
Vibration Isolation at 2 Hz ≥90%
Vibration Isolation at 10 Hz ≥99%
Input Voltage (V) AC100 - 240V / 50 - 60 Hz / 1A
Power Consumption (W) Maximum 110W, <50 W in normal operation
Operating Range Temperature (°C) 5 - 50 °C
Humidity (%) 20 - 90%
Required Air Pressure ≥ 0.5 MPa (5 bar)

4. Installation Photos

DVIA MB1000 Raith EBL&SEM Pioneer Two

5. Summary

Vibration Criterion Curves
Frequency Range 1-10 Hz 10 - 80 Hz
Measurement Direction Z axis (Vertical) X axis (Left to Right) Y axis (Front to Back) Z axis (Vertical) X axis (Left to Right) Y axis (Front to Back)
Floor VC-B (Fail) VC-D (Fail) VC-D (Fail) VC-C (Fail) VC-E (Fail) VC-F (Pass)
On Active Vibration Isolation System VC-G (Pass) VC-G (Pass) VC-E (Pass) VC-E (Pass) VC-G (Pass) VC-G (Pass)

The floor vibration specification of the RAITH Pioneer Two is extremely challenging, the measured floor vibrations did not meet the vibration specification. DAEIL SYSTEMS’s active vibration isolation system reduced the floor vibration in Z, X and Y axis, achieved to meet the vibration specification.

6. Results
Z-axis (Vertical)

DVIA MB1000 Raith EBL&SEM Pioneer Two z-axis-vertical

AVI = Active Vibration Isolation

The measured vertical floor vibration exceeded the allowable floor vibration values from 1 to 80 Hz.
After the installation of DAEIL SYSTEMS’s active vibration isolation system, the floor vibrations were reduced to meet the floor vibration specification.

X-axis (Left to Right)

DVIA MB1000 Raith EBL&SEM Pioneer Two x-axis-left-to-right

AVI = Active Vibration Isolation

The measured floor vibration in X axis below 10 Hz exceeded the allowable floor vibration. DAEIL SYSTEMS’s active vibration isolation system reduced the floor vibration from VC-E to VC-G in 1 – 80 Hz, meeting the floor vibration specification.

Y-axis (Front to Back)

DVIA MB1000 Raith EBL&SEM Pioneer Two y-axis-front-to-back

AVI = Active Vibration Isolation

The low frequency floor vibration at 1.6 Hz, 5 Hz, 6.3 Hz exceed the allowable floor vibration values.
DAEIL SYSTEMS’s active vibration isolation system reduced these vibrations, achieved to meet the floor vibration specification

7. Reference
Generic Vibration Criteria

Criterion Curve Description Amplitude1) μm/s (in/s) Detail Size2) μm
Workshop (ISO) Distinctly perceptible vibration, Appropriate to workshops and non-sensitive areas. 800 (32,000) N/A
Office (ISO) Perceptible vibration. Appropriate to offices and non-sensitive areas. 400 (16,000) N/A
Residential Area (ISO) Barely perceptible vibration. Appropriate to sleep areas in most instances. Usually adequate for computer equipment, hospital recovery rooms, semiconductor probe test equipment, and microscopes less than 40x. 200 (8,000) 75
Operating Theatre (ISO) Vibration not perceptible. Suitable in most instances for surgical suites, microscopes to 100x and for other equipment of low sensitivity. 100 (4,000) 25
VC-A Adequate in most instances for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc. 50 (2,000) 8
VC-B Appropriate for inspection and lithography equipment (including steppers) to 3pm line widths. 25 (1,000) 3
VC-C Appropriate standard for optical microscopes to 1000x, lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size, TFT-LCD stepper/scanner processes. 12.5 (500) 1-3
VC-D Suitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems. 6.25 (250) 0.1-0.3
VC-E A challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, laser-based, small target systems, E-Beam lithography systems working at nanometer scales, and other systems requiring extraordinary dynamic stability. 3.12 (125) <0.1
VC-F Appropriate for extremely quite research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation. 1.56(62.5) N/A
VC-G Appropriate for extremely quite research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation. 0.78(31.3) N/A
  1. As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).
  2. The detail size refers to line width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc, It is not relevant to imaging associated with probe technologies, AFMs, and nanotechnology.

    The information given in this table is for guidance only. In most instances, it is recommended that the advice of someone knowledgeable about applications and vibration requirements of the equipment and processes be sought.